This new equipment allows rapid and semi-quantitative depth profiling (from a few nanometers to tenths of microns) and bulk analysis on a large set of elements.

An additional detector allows to choose a complementary element not present in the previous list to complement the analysis for more exotic elements

This technique is sensitive from ppm to 100%, is efficient on conductors as well as insulators thanks to the RF source for sputtering.  The elemental signals are analysed through optical emission spectrometer.  In order to enhance sensitivity or sputtering efficiency, the sputtering gas can be changed following the most recent advances in the glow discharge knowledge.